GEMStar™ Benchtop Atomic Layer Deposition Process Systems

GEMStar™ Benchtop Atomic Layer Deposition Process Systems

GEMStar™ Benchtop Atomic Layer Deposition Process Systems

GEMstar’s ALD product line deposits low temperature conformal metal, semiconductor and insulating films on planar and high aspect ratio (HAR) structures. These ALD systems are designed for uniform conformal growth of films from precursors that have a CVD growth component.

The uniformity of thin films can determine whether a process or device works. These systems are designed to provide the user with the most uniform films possible, even in challenging HAR through-hole applications.

ARR-40900 GEMStar-6 Benchtop ALD System

The 150mm Ø system deposits low temperature conformal metal, semiconductor and insulating films on planar and high aspect ratio (HAR) structures. It is designed for uniform conformal growth of films from precursors that have a CVD growth component.

ARR-840900 GEMStar-8 Benchtop ALD System

The 200mm Ø system deposits low temperature conformal metal, semiconductor and insulating films on planar and high aspect ratio (HAR) structures. It is designed for uniform conformal growth of films from precursors that have a CVD growth component.

ARR-940900 GEMStar-A Benchtop Controlled Gas Environment Anneal System

The 200mm square system anneals substrates in a vacuum controlled user selectable gas environment.

 

GEMStar-6 Data Sheet

GEMStar-8 Data Sheet

GEMStar-A Data Sheet

GEMStar-6/8 Standard Thermal ALD Connections